Min-Hung Tsai is a Principal R&D Engineer at TSMC, specializing in process and metrology optimizations of nanolithography for advanced semiconductor nodes. With over five years of experience in the European chemical industry, they previously held roles as an Engineering Manager at Daxin Materials Corporation and a Technical Service Engineer at Shin-Etsu Silicones Europe B.V. Min-Hung served in the Ministry of National Defense in Taiwan and has completed internships at both Central Research Institute and FMP Berlin. They hold a Bachelor of Science in Chemistry from National Taiwan University and a Master of Science in Chemistry from Humboldt-Universität zu Berlin.
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