Wei Tian is a Technical Manager at TSMC, specializing in plasma modeling for process development in etching and deposition. They hold a PhD in Nuclear Engineering and Radiological Sciences from the University of Michigan, where they focused on low temperature plasmas. Wei has extensive experience in developing computational platforms and conducting theoretical research related to plasma processing systems, collaborating with universities to advance their work. Their research contributions have resulted in numerous publications and conference presentations. Prior to their current role, Wei worked at Applied Materials in various scientific capacities, including as a physicist/scientist E4.
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