YU-CHI LIN is a Research and Development Engineer at TSMC, bringing a background in engineering with four years of experience in innovation and data analysis focused on cutting-edge materials. They previously served as a Senior Research and Development Engineer at TSMC, where they contributed to N3 FEOL etch R&D and were a co-inventor of a US patent. Earlier, they held a researcher position at National Cheng Kung University, achieving outstanding academic success with a published essay and participation in scientific conferences. YU-CHI holds a Master's degree in Chemical Engineering and a Bachelor's degree in Environmental Health Engineering from the same institution.
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