Karine Rovayaz

Karine Rovayaz is an experienced Dry Etch Process Engineer currently working at Aledia since April 2021. Prior to this role, Karine served as an R&D Etch Engineer at STMicroelectronics from April 2018 to April 2021 and worked as a Plasma Etching Engineer at Laboratoire des Technologies de la Microélectronique - LTMLab from November 2016 to April 2018, where there was a focus on developing plasma etching processes for 300 mm machines with III-V materials. Earlier experience includes serving as an Applications Engineer at CORIAL from September 2011 to June 2014, specializing in process development for microelectronics and nanotechnology applications. Karine holds a Master's degree in Physics and Plasma Applications from Université Grenoble Alpes, and additional degrees in Physics from the same university and Université Savoie Mont Blanc.