Aledia
Karine Rovayaz is an experienced Dry Etch Process Engineer currently working at Aledia since April 2021. Prior to this role, Karine served as an R&D Etch Engineer at STMicroelectronics from April 2018 to April 2021 and worked as a Plasma Etching Engineer at Laboratoire des Technologies de la Microélectronique - LTMLab from November 2016 to April 2018, where there was a focus on developing plasma etching processes for 300 mm machines with III-V materials. Earlier experience includes serving as an Applications Engineer at CORIAL from September 2011 to June 2014, specializing in process development for microelectronics and nanotechnology applications. Karine holds a Master's degree in Physics and Plasma Applications from Université Grenoble Alpes, and additional degrees in Physics from the same university and Université Savoie Mont Blanc.
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Aledia
Aledia develops and manufactures innovative light-emitting diodes based on a unique 3D architecture using gallium-nitride on-silicon microwires.The technology uses standard silicon wafers with diameters of 8 inches (200 mm) and existing CMOS wafer-fabrication processes and tools, enabling the production of LED chips at 25 percent of the cost oftraditional planar LED chips. The process and tools help develop both mobile displays and microdisplays for AR/VR applications, enabling users to use them for direct-view displays such as for smartphones, smartwatches, tablets, and laptops. In 2011, Giorgio Anania, Philippe Gilet, and Xavier Hugon co-founded the Grenoble, Rhone-Alpes-based company.