Jacqueline Wrench

Snr Principal Engineer, Global Product Manager at ASM International NV

Jacqueline Wrench is a highly experienced engineer and product manager with a robust background in materials science and chemical engineering. Currently serving as a Senior Principal Engineer and Global Product Manager at ASM since October 2021, Jacqueline previously held various roles at Applied Materials from January 2017 to October 2021, including Process Engineer MTS and Senior Process Engineer. Jacqueline's academic journey began with a PhD in Synthetic Inorganic Chemistry from the University of Liverpool, supplemented by a Master's in Chemistry with Industrial Chemistry. Additionally, Jacqueline has significant postdoctoral experience, including contributions at the University of Liverpool and Tyndall National Institute, focusing on atomic layer deposition and synthesis of materials for advanced applications. Early career experiences include a fellowship in Japan and an industrial placement at AstraZeneca, emphasizing research in drug discovery.

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ASM International NV

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ASM International N.V. is a supplier of wafer processing equipment, primarily for semiconductor manufacturing industry. The Company designs, manufactures and sells equipment and services to its customers for the production of semiconductor devices, or integrated circuits (ICs). The Company operates in two segments, which include Front-end and Back-end. The Front-end segment manufactures and sells equipment used in wafer processing, encompassing the fabrication steps in which silicon wafers are layered with semiconductor devices. The front-end segment includes manufacturing, service, and sales operations in Europe, the United States, Japan and South East Asia. The Back-end segment manufactures and sells equipment and materials used in assembly and packaging, encompassing the processes in which silicon wafers are separated into individual circuits. The Company supplies equipment to the manufacturers of analog semiconductor devices primarily for the deposition of thin films.


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1,001-5,000

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