Felix Waehlisch

Felix Waehlisch has extensive experience in the field of optics and nanotechnology, currently serving as an EUV POB Architect at ASML since February 2013, responsible for mirror heating and EUV projection optics with a focus on low NA, field systems, and the NXE:3600. Previously, Felix was a technical lead imaging design engineer, managing a team of 17 on imaging performance for EUV volume systems. Felix's academic background includes a Dipl. Ing. in Nanotechnology from The Julius Maximilians University of Würzburg and prior educational achievements at local high schools, culminating in a strong focus on scientific disciplines. Prior to ASML, Felix gained research experience as a PhD student at the INM-Leibniz Institute for New Materials and worked as a student assistant at Fraunhofer IBMT and Julius-Maximilians-University Würzburg.