Cemil Atay

Cemil Atay is the LTD Etch Director at Intel Corporation, where they manage a team of over 40 managers and technologists focused on Upper BEOL layer development. Previously, Cemil held various engineering roles at Intel, including D1C 65nm Dry Etch Group Leader and D1C Staff Engineer, contributing to significant technology developments such as the first tri-gate/FIN FET etch. Cemil earned multiple degrees, including a Bachelor's Degree in Chemistry and a BS in Chemical Engineering from the University of Massachusetts, Amherst, and advanced degrees in Engineering, Finance, and Business Administration.