Sarah Niroumand

Sarah Niroumand is an experienced professional in lithography and design rule engineering, currently serving as a Lithography Technology Program Manager at JSR Micro, Inc. since September 2022. Prior to this role, Sarah was a Lithography Engineer at Photronics, focusing on data analysis to derive e-beam and laser write parameters. With extensive experience at Micron Technology from 1995 to 2018, roles included Sr RG NAND Design Rule Engineer, where responsibilities encompassed optimizing 3D RG NAND design rules and partnering with process integration teams, as well as contributions to DRAM design rules and advanced mask development. Sarah holds a Bachelor of Science in Chemical Engineering from The University of Tulsa.