Tejumade Durowade is an experienced electrical engineer with a strong background in semiconductor materials processing, nanotechnology, and lithography. From May 2011 to July 2011, Tejumade served as a visiting scholar with the Applied Plasma Physics Group at the University of Sydney, focusing on Titanium Dioxide growth and characterization. Since January 2021, Tejumade has been an R&D IC engineer at Keysight Technologies, specializing in lift-off lithography. Previous roles include a test engineering intern at EPIR, a graduate research student at the Microphysics Laboratory at the University of Illinois at Chicago, and a graduate research assistant at the Nanotechnology Core Facility. Tejumade holds a Bachelor of Science and a Doctor of Philosophy in Electrical and Electronics Engineering from the University of Illinois at Chicago, as well as a Master of Science degree in the same field. Additionally, Tejumade attended Yonsei University for general education.
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