ranadeep bhowmick

Ranadeep Bhowmick is the Technical Director at Lam Research, where they have been part of the Dielectric Etch Concept & Feasibility group since 2010. With over 15 years of research experience stemming from a PhD in Materials Science from Stanford University, they specialize in developing Reactive Ion Etch processes and products. Their work centers on enhancing plasma and surface interactions to improve die and wafer uniformity, and they actively implement advanced RF technologies for future memory tools. Prior to their current role, they held several engineering positions at Lam Research, focusing on process control and productivity solutions.