Shelby Nelson Ph.d

Shelby F. Nelson is a semiconductor device physicist with broad industrial research experience. Her work has included ferroelectric materials at AT&T Bell Labs, silicon/germanium heterostructures at IBM’s Thomas J. Watson Research Center, and a mixed-signal CMOS process for ink-jet ejector heads at Xerox Corporation. In addition, Dr. Nelson spent 16 years as a Senior Research Scientist in the area of thin-film and printed electronics at the Kodak Research Labs.