OLIN
Selina Cheah is an accomplished landscape designer currently serving as Landscape Designer II at OLIN since August 2022. Previously, Selina held the position of Research Assistant at The Ian L. McHarg Center for Urbanism and Ecology from May 2020 to May 2022, contributing to the Field Notes towards an Internationalist Green New Deal. Additionally, Selina gained teaching experience as a Graduate Teaching Assistant at the University of Pennsylvania from 2020 to 2022, focusing on core courses in landscape architecture and urban development. Selina's internship experiences include roles as a Landscape Architecture Intern at OLIN in 2021 and as a Planning and Urban Design Intern at WRT, LLC in 2019. Selina's educational background includes a Master's degree in Landscape Architecture & City and Regional Planning from the University of Pennsylvania, as well as a Bachelor's Degree in Journalism, Urban Design and Architectural Studies from New York University, and a high school diploma from Milton Academy.
OLIN
OLIN is dedicated to affecting positive change through landscape architecture, urban design and planning. We are advocates for the artful creation and transformation of the public realm, and practice in a range of scales, including ecological and regional systems, urban districts, campuses, civic parks, plazas, and intimate gardens. From our studios in Philadelphia and Los Angeles, OLIN crafts timeless spaces that promote social interaction and enhance life. We successfully realize projects locally and internationally, each one reflecting its unique context. Through rigorous research, analysis and a dynamic design process, OLIN incorporates the intrinsic qualities of a site to generate a landscape that is embraced by its community. Sustainability is a central tenet of our holistic approach, uniting natural processes with technical innovation to produce contemporary and beautiful places. We collaborate with clients, architects, engineers, artists and communities to build consensus among diverse interests while attaining the highest level of design integrity.