Han-Ching Lin is a seasoned professional in the semiconductor manufacturing industry, currently serving as the Scientific & Laboratory Service Manager at Pall Corporation since January 2024, focusing on application development and troubleshooting of filtration processes. Prior to this role, Han-Ching held positions including Assistant Manager at JSR Corporation, leading R&D efforts in advanced wet etch/clean technology, and Principal Engineer at Tokyo Ohka Kogyo Co Ltd, specializing in wet clean/etch research for advanced technology nodes. Additional experience includes serving as Area Manager at DuPont, overseeing new factory establishment and high-volume manufacturing, and as a Consulting Engineer at Entegris, focusing on fluid sensor instruments. Han-Ching's earlier roles as Principal Engineer at TSMC and Supervisor at BASF involved significant contributions to cleaning and etching processes and chemical formulation. Han-Ching Lin earned a Ph.D. in Applied Chemistry from National Chiao Tung University, along with a Master's degree and a Bachelor's degree in Applied Chemistry and Chemical Engineering, respectively.
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