Shuo Huang is an experienced R&D Engineer at Synopsys Inc since October 2017, focusing on developing resist and etch process modeling for mask solutions. Previously, Shuo served as a Research Assistant at the University of Cincinnati from September 2011 to August 2017, analyzing complex engineering problems using ANSYS and ABAQUS, and also worked at the UC P&G Simulation Center, developing programs for finite element analysis. Earlier experience includes research at Northwestern Polytechnical University, where Shuo utilized GPU computing for acoustic problem-solving and simulated fluid dynamics related to rocket engines. Shuo holds a PhD and a Master’s Degree in Mechanical Engineering from the University of Cincinnati, alongside a Bachelor’s Degree in Aerospace, Aeronautical and Astronautical Engineering from Northwestern Polytechnical University.
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