Angélique Raley

Angélique Raley is a highly experienced professional in the field of technology and engineering, currently serving as the Director of Technology in integration and 3DI at Tokyo Electron US since August 2010. Raley's career includes roles such as Director of the Etch Product Business Unit, focusing on More than Moore technologies, and Manager of Process Development Engineering, where responsibilities included overseeing a team specializing in BEOL plasma etch process development. Prior experience includes working as a Principal Research Development Engineer, as well as significant contributions at Samsung Semiconductor as a NAND Flash FEOL Process Integration Engineer. Raley began the career with internships at Caltech, UC Berkeley, and Freescale Semiconductor, showcasing a strong foundation in research and development. Educational credentials include a Master’s degree in Material Science and Engineering from Polytech Grenoble and additional studies at the University of California, Berkeley.