TPSCo
Mr. Sasaki was appointed Chief Technology Officer of TPSCo in April 2014 at the time of the company’s founding. Previously he was Director of the ULSI Process Technology Development Center at Panasonic Corporation.
He led the 300mm Fab start-up in Uozu and developed CMOS processes from 65nm down to 32nm, which offered the world’s first manufacturable “Gate First” High-k/Metal gate technology. He also led frontside illumination image sensors with light pipe technology, RF GaAs technology, and many others.
He joined Matsushita Electric Industrial Co., Ltd. in 1987 where he contributed a great deal of new process development through his remarkable dry etching expertise.
Mr. Sasaki received his B.S. degree in Chemistry from Kyoto University, Kyoto, Japan in1987.
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