René Oesterholt is the Director of Development & Engineering for DUV System Performance at ASML, where they lead a department of over 160 individuals dedicated to integrating and releasing lithographic solutions. René has held various managerial roles within ASML, including Senior Manager of System Engineering and Development & Engineering, overseeing teams focused on system performance and technology development. They earned a Master of Science in Applied Physics from Rijksuniversiteit Groningen and graduated with distinction in a Professional Doctorate in Engineering from the University of Twente, alongside completing an Advanced Leadership Acceleration Program at IMD Business School. René began their career as a student at imec and has since contributed to numerous innovative projects in the lithography field.
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