Yi-Hsin Chang is an Application Development Manager at ASML, bringing over four years of product development experience focused on holistic solutions for semiconductor processes. They have a strong background in ASML photolithography systems and significant expertise in system performance calibrations, as well as photolithography process control. Previously, Yi-Hsin served as a Research Assistant at the Instrument Center of the National Science Council and held positions as a Senior Application Development Engineer and Technical Instructor, cultivating skills in global customer engagement, project management, and team leadership. They earned a PhD in Material Science and Engineering from National Tsing Hua University.
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