Fujimi Corporation
W. Scott Rader has a diverse work experience in various leadership roles and positions in research and development. W. Scott started their career at OI Analytical in 1995 as an Applications Manager and worked there until 1998. In 1998, they joined Fujimi Corporation and held multiple positions, including Product Development Chemist, Manager of Research and Development, Director of Research and Development, Vice President, Director of New Business Development, Board Member, and currently, Executive Vice President. Throughout their career, they have been involved in the formulation of polishing slurries for the disk drive and CMP industries, process development, and production of products.
W. Scott Rader's education history includes completing the Stanford Executive Program at the Stanford University Graduate School of Business in 2021. Prior to that, they obtained a Doctor of Philosophy (Ph.D.) in Inorganic Chemistry from the University of Nevada, Reno, from 1990 to 1995. W. Scott'sundergraduate studies were at George Fox University from 1986 to 1990, where they earned a Bachelor of Science (BS) degree in Chemistry.
Fujimi Corporation
Fujimi is a global leader in lapping, abrasive, and polishing materials. We actively have products spanning various industries and are heavily utilized in the supply chain of semiconductor manufacturing organizations worldwide. Our array of products iniclude abrasive powders and slurries, CMP slurries, grinding and polishing supplies and CERMET thermal spray materials to name a few. In addition to our products, we have manufacturing facilities setup for applying some of our core competencies and technologies, including classification and separation of particles by particle size, mixing, and blending. Our highly qualified and experienced staff is capable of supporting you and your organization in applying our products and technology in your processes.