Sean D'Silva is a Senior Research Scientist in Computational Lithography at Huawei, where they focus on optical proximity correction and photoresist model development. They previously served as a Postdoctoral Researcher at Fraunhofer IISB, developing simulation models for novel photoresist materials in EUV lithography. Their background includes experience as a Research Engineer in computational lithography, and they completed internships involving thermodynamic simulations and FEM projects. Sean holds a Ph.D. in Computational Lithography from FAU Erlangen-Nürnberg, along with a Master's Degree in Computational Mechanics and Dynamics and a Bachelor's Degree in Mechanical Engineering.
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