Multibeam Corporation
Mike Radtke has a significant amount of work experience in the engineering field. Mike started their career as a Product Engineer and Associate Test Engineer at KLA-Tencor in 1996. From there, they worked as an Electrical Engineer at Mattson Technology from 2000 to 2007, then at Applied Materials as an Electrical Engineer in 2007 to 2008.
Radtke then returned to Mattson Technology in 2008, where they held two different roles: Electrical Engineering Manager from 2008 to 2015, and Sr. Engineering Manager from 2015 to 2016.
In 2016, Radtke joined Kateeva as a Sr. Manager, Mfg. Engineering, and later became the Director of Manufacturing Engineering from 2018 to 2019. Mike then transitioned to become the Director, Engineering Project Management from 2019 to 2020.
Following their time at Kateeva, Radtke worked at Yield Engineering Systems from 2020 to 2023. Mike held two roles at this company: Director of Program Management from 2020 to 2022, and Senior Director of Engineering from 2022 to 2023.
Currently, Radtke is the Director, Engineering Program Management at Multibeam Corporation, starting from 2023.
Overall, Radtke's work experience demonstrates a progressive career in engineering and program management roles.
Mike Radtke attended ITT Technical Institute from 1992 to 1996, where they earned a BSEET degree in Electronics.
This person is not in any teams
Multibeam Corporation
2 followers
Multibeam has re-innovated e-beam lithography to enable cost-effective production of leading-edge semiconductors for advanced packaging, photonics, rapid prototyping, and other special applications. It is the industry’s only maskless multi-column e-beam platform that offers full-wafer direct write patterning capabilities with fine resolution in a modular architecture that is optimized for scale. The fully automated system features multiple miniaturized e-beam delivery columns and advanced algorithms that enable precision patterning with fab-level productivity. Innovated by patterning and wafer fab equipment experts, our systems empower IC leaders to make patterns that are impossible, difficult, or too expensive for mask-based solutions, with breakthrough time-to-market advantages.