Robert Hoelle is a Senior Dualbeam Analyst at NanoLab Technologies, where Robert has been employed since August 2011. Prior to that, Robert was the Lab Manager of the W. M. Keck Center for Nanoscale Optofluidics at UC Santa Cruz from June 2009 to June 2011. Robert also worked as a Senior Applications Engineer for Circuit Modification at FEI Company from 2006 to 2009, and Robert started their career as a Backside Circuit Edit Engineer at Intel Corporation from September 2000 to June 2006. Robert holds a Specialized Associate of Arts in Electron Microscopy from San Joaquin Delta College and a Bachelor of Science in Physics from the University of California, Berkeley.
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