Alex Zepka is a Principal Engineer with extensive experience in the semiconductor manufacturing industry, focusing on lithography technologies such as E-Beam and EUV. They have contributed to the advancement of Moore's Law through roles at Synopsys Inc., where they are currently a Staff Engineer specializing in e-beam lithography. Alex holds a PhD in Astronomy and Physics from Cornell University and served as a Post-Doctoral Scholar in Astrophysics at the University of California, Berkeley. They previously worked as a CAD Engineer at Hitachi Micro Systems Inc. from 1997 to 1998.
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