Jun Shinagawa

Jun Shinagawa is an experienced technical professional with a strong background in equipment control and process optimization within the semiconductor industry. Currently serving as a Technical Lead at Tokyo Electron US since February 2016, Jun specializes in autonomous equipment control and plasma etch process automation. Prior experience includes a role as a Staff Design Enablement Engineer at GLOBALFOUNDRIES, where Jun led the development of design verification decks for advanced node integrated circuits, and as a Senior Process Engineer at Lam Research Corporation, focusing on 450mm plasma etch chamber development. Jun holds a PhD in Physics with a specialization in Experimental Condensed Matter Physics and a BS in Physics, both from UCLA.