Hoang M. Nguyen

Hoang M. Nguyen is a Senior Process Engineer I at ASM, specializing in researching and developing atomic layer deposition (ALD) processes for metal and dielectric thin films in CMOS Gate Stack since November 2022. Previously, as a Doctoral Researcher at Aalto University, Hoang developed a novel thin film process and published four first-author papers, supervised two Master's students, and secured a research grant. Experience as a Research Assistant at Korea University involved creating a nanofabrication process, collaborating on photocatalytic projects, and advising Bachelor's students, one of whom received a Best Poster Project award. An engineering internship at GE focused on supporting 3D printing development for nuclear power applications. Academic qualifications include a PhD in Chemistry from Aalto University and a Master's degree in Advanced Materials Chemistry from Korea University.