Giovanni De Amicis

Giovanni De Amicis has extensive work experience in the semiconductor industry, particularly in CMOS image sensor (CIS) technology development. Giovanni started their career at Texas Instruments in 1994, where they worked as a Process Engineer and later as a Process Technical Coordinator in the Dry Etch Area. Giovanni was responsible for silicon oxide dry etch processes and equipment, including selection, installation, and qualification of new etchers.

In 1998, De Amicis joined Micron Technology, where they held various roles in the R&D division. As a Senior Process Engineer, they focused on Poly contact, Tungsten interconnection, and DRAM Cell process integration, with a focus on yield improvement, process flow simplification, and cost reduction. Giovanni also served as a Senior Process Integration Engineer, contributing to pixel technology development and optimization, including light pipe, antireflective coating, dielectric lens development, optical path optimization, and dark current reduction.

In their later years at Micron Technology, De Amicis became a Principal Process Engineer and played a key role in introducing backside illumination technology in CMOS image sensors. Giovanni was promoted to a Distinguished Member of Technical Staff and led the pixel technology development and performance improvement.

Since 2013, De Amicis has been working at LFoundry, where they have held several positions. Giovanni initially served as the R&D Principal Process Integration Engineer, focusing on BSI technology performance improvement and global shutter pixel technology development. Giovanni then took on the role of R&D Technology Development Manager, leading the pixel development R&D team and focusing on BSI and global shutter performance improvement and 110nm image sensor technology development.

In 2017, De Amicis was promoted to the position of R&D CIS Technology Development Director at LFoundry. In this role, they led the CMOS image sensor R&D team, overseeing optical and electrical simulation, pixel characterization, BSI technology improvement, LFoundry image sensor PDK improvement, and the introduction of Hybrid Bonding technology.

Their most recent role at LFoundry is the R&D CIS Technology Development Leader, which they have held since December 2019. In this position, De Amicis continues to lead the CMOS image sensor R&D team and drives the development of CIS technologies and processes.

Overall, Giovanni De Amicis has demonstrated expertise in CMOS image sensor technology development, with a strong focus on performance improvement, pixel optimization, and the introduction of new technologies.

Giovanni De Amicis obtained a Master's degree in Engineering from the Università degli Studi dell'Aquila. Their educational journey took place from 1986 to 1991.