Jeffrey Gelorme

Jeff has degrees in Polymer Science and Engineering from University Of Massachusetts, Amherst (M.Sci) and Pennsylvania State University (B.Sc). He worked at IBM’s T.J. Watson Research Ctr, Yorktown Hts, NY from ’87-2014 and IBM Endicott from ’81-’87. He has experience solving problems in applied polymer science in every aspect of the electronics industry, from printed circuit boards, to silicon microchips, to packaging and systems integration. He has worked in every commercially available polymer system and has synthesized his own unique polymer systems where required. An expert in custom formulations from silicones to epoxies, he has many patents granted for custom coatings, adhesives, photoresist, etc. He is the inventor of the SU8 photoresist systems now used in all MEMs and micro-machining foundries around the world.