Mikhail Novozhilov

As Chief Technology Officer, Mikhail leads the product development and manufacturing teams at MetOx. As an award-winning research scientist, while a student at Moscow State University Mikhail was one of the first people in history to create a spectrum of new materials in thin film state using epitaxial stabilization.

Previously at Samsung Technology Development Corp, Misha joined MetOx in 2006, and has since been the principal scientist and technical lead in the development of three generations of MetOx modified MOCVD production systems. Mikhail brings a unique breadth of experience in thin film deposition techniques, QC techniques, chemical engineering, and process automation to the operations.

His process development experience related to core HTS technology enables him to bring fundamental scientific guidance to the technical staff he leads.