Xinye Liu

Xinye Liu has a significant work experience in process technology and engineering management. Currently, they are serving as the Director of Process Technology at Eugenus, Inc. Prior to this, they worked at Intel Corporation as an Engineering Manager, where they successfully managed a team to sustain high-volume manufacturing (HVM) and develop new processes. Their contributions led to a reduction in defects on the production line, improving the quality and yield of products.

Before their time at Intel, Xinye Liu held the position of Sr. Director of PLC Engineering & Operation at Enablence Technologies. In this role, they managed the daily operations for photonic device fabrication and led teams in wafer process, equipment, and chip testing to sustain production. Xinye also collaborated with the chip design team on product development, integration, and yield improvement.

Earlier in their career, Xinye Liu worked at WD (a Western Digital company) as a Sr. Engineering Manager Process Development. In this role, they managed a team of process engineers and implemented automation in production to improve equipment capability and reduce chemical consumption. Xinye also led critical failure analysis projects, eliminating unexpected defects and minimizing wafer loss.

Xinye Liu's experience also includes working as a Technical Manager at Rohm and Haas, where they led a team providing technical support to ALD/CVD precursor sales and marketing teams. Xinye managed internal research projects and collaborations with outside research institutions, focusing on metal and high-k thin film applications.

Prior to that, Xinye Liu worked as a Technologist at Novellus Systems (acquired by Lam Research Corporation), where they invented highly selective atomic layer etch (ALE) technology for etching SiO2/SiNx/Si and developed ALE processes with wide semiconductor applications.

Xinye began their career at Applied Materials as a Member of Technical Staff, where they developed PECVD and ALD tools and processes for SiO2 deposition. Xinye also worked on software development for ALD equipment control.

Xinye Liu's early experience includes working as a Process Development Manager at Genus/Aixtron, where they pioneered O3 based ALD processes and developed thermal ALD and PEALD processes for depositing highly conformal thin films.

Xinye also worked at BTU International as a Staff Engineer, where they conducted marketing research on fuel cell applications and developed a low-temperature CVD process for depositing AlN diffusion barriers.

Overall, Xinye Liu's work experience showcases their expertise in process technology, engineering management, and collaboration with research and development teams. Through their leadership and technical skills, they have made significant contributions to product quality, yield improvement, and process innovation in the semiconductor industry.

Xinye Liu holds a Bachelor of Science (B.S.) degree in Physics from Peking University. Furthermore, Xinye Liu is currently pursuing a Ph.D. in Chemical Physics at the Harvard Kenneth C. Griffin Graduate School of Arts and Sciences. The specific start and end years for each educational experience are unknown.